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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

Radiolytic yield of U(IV) oxidation into U(VI): a new mechanism for U(V) reactivity in acidic solution

E Atinault1, V De Waele, J Belloni

  • 1Laboratoire de Chimie Physique/ELYSE, CNRS-Université Paris-Sud, Orsay, France.

The Journal of Physical Chemistry. A
|January 19, 2010
PubMed

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