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Soft-etch mesoporous hole-conducting block copolymer templates.

Edward J W Crossland1, Pedro Cunha, Steve Scroggins

  • 1Cavendish Laboratory, J. J. Thomson Avenue, University of Cambridge, Cambridge CB3 0HE, UK.

ACS Nano
|January 27, 2010
PubMed
Summary

We developed a mesoporous hole-conducting polymer film using block copolymer self-assembly. This method creates ordered nanopores for advanced thin-film electronic devices.

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Area of Science:

  • Materials Science
  • Polymer Chemistry
  • Nanotechnology

Background:

  • Developing ordered nanostructures in polymer films is crucial for advanced electronic applications.
  • Block copolymer self-assembly offers a versatile route to create well-defined nanoscale morphologies.
  • Hole-conducting polymers are essential components in organic electronics.

Purpose of the Study:

  • To create a mesoporous hole-conducting polymer film via spontaneous block copolymer self-assembly.
  • To investigate the self-assembly behavior of a specific diblock copolymer (PSTPA-b-PLA).
  • To demonstrate the fabrication of nano-organized heterojunction structures.

Main Methods:

  • Spin-coating a diblock copolymer (PSTPA-b-PLA) solution onto conducting substrates.

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  • Utilizing spontaneous microphase separation of the diblock copolymer.
  • Selective etching of poly(d,l-lactide) (PLA) domains to create porosity.
  • Electrochemical replication of the pore structure in platinum.

    • Main Results:

    • Ordered 13 nm cylindrical PLA microdomains were formed within a semiconducting triphenylamine side group polymer (PSTPA) matrix.
    • Partially ordered and film-spanning PLA domains were observed immediately after spin coating.
    • Selective etching of PLA domains yielded a mesoporous hole-conducting polymer matrix.
    • Successful electrochemical replication of the mesoporous structure in platinum was achieved.

    Conclusions:

    • Spontaneous block copolymer self-assembly provides a facile method for creating mesoporous hole-conducting polymer films.
    • The developed technique enables the fabrication of nano-organized heterojunction structures in thin films.
    • This approach holds promise for applications in advanced electronic devices.