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Updated: Jun 16, 2026

Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
Published on: May 28, 2016
Filtering of defects in integrated circuits with orientation independence
Abstract:
Defect enhancement in semiconductor wafers is shown to be possible by spatial frequency filtering without the necessity for filter alignment. The technique depends on the wafer being sufficiently periodic. Coherent optical and digital computer simulation results are presented.
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