Thin organosilicon films for integrated optics.

Area of Science:

• Materials Science
• Optoelectronics
• Polymer Chemistry

Background:

• Integrated optics development requires advanced thin-film materials for optical circuitry.
• Existing materials may not meet all requirements for high-performance optical devices.

Purpose of the Study:

• To investigate novel thin films produced by rf discharge polymerization of organic monomers.
• To evaluate the optical properties and processability of these new films.
• To demonstrate control over the refractive index for tailored optical applications.

Main Methods:

• Radio-frequency (rf) discharge polymerization of vinyltrimethylsilane and hexamethyldisiloxane monomers.
• Characterization of film properties including smoothness, toughness, pinhole density, and transparency.
• Measurement of optical loss for light-wave propagation using prism-film coupling.
• Investigation of refractive index control via monomer mixing and post-deposition chemical treatment.

Main Results:

• Films exhibit desirable properties: smooth, tough, pinhole-free, and transparent from 0.4 to 0.75 micrometers.
• Achieved very low optical loss (<0.04 dB/cm) crucial for efficient light propagation.
• Demonstrated successful control of refractive index through monomer composition and chemical modification.
• Detailed discussion on the application of prism-film couplers for precise refractive index measurement.

Conclusions:

• Rf discharge polymerization yields high-quality organic thin films suitable for integrated optics.
• Tunable refractive index offers significant potential for designing advanced optical circuits and devices.
• These materials represent a promising advancement for the field of optoelectronics.