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Fabrication of integrated optical elements using a computer-controlled electron beam.

D B Ostrowsky, M Papuchon, A M Roy

    Applied Optics
    |February 4, 2010
    PubMed
    Summary
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    Electron beam lithography fabricated complex thin film waveguide structures in polyphenylsiloxane. Losses are mainly due to scattering, suggesting potential for improved performance.

    Area of Science:

    • Materials Science
    • Optics
    • Nanotechnology

    Background:

    • Electron beam lithography is a key technique for fabricating micro/nanoscale structures.
    • Thin film waveguides are essential components in integrated optics and photonics.

    Purpose of the Study:

    • To demonstrate the fabrication of complex thin film waveguide structures using computer-controlled electron beam lithography.
    • To characterize the fabricated structures and their optical losses.

    Main Methods:

    • Utilized a computer-controlled electron beam system for high-resolution patterning.
    • Employed an interferometric substrate positioning technique for precise alignment over macroscopic distances.
    • Fabricated various waveguide elements including straight, curved, transition, directional coupler, and resonant ring structures.

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    Demonstration of Equal-Intensity Beam Generation by Dielectric Metasurfaces
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    Main Results:

    • Successfully fabricated complex thin film waveguide structures with widths of 5 or 10 micrometers and lengths up to several centimeters.
    • Measured optical losses in the range of 2 to 5 dB/cm at a wavelength of 6328 Angstroms.
    • Identified localized protuberances as the primary source of scattering losses.

    Conclusions:

    • Computer-controlled electron beam lithography is effective for creating intricate thin film waveguide designs.
    • Scattering losses can likely be mitigated by addressing surface imperfections, paving the way for lower-loss optical devices.