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Updated: Jun 16, 2026

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
Published on: June 12, 2018
Abstract:
Patterns with optimal autocorrelation functions are sometimes optimal for optical alignment. When the finest gratings that can be resolved exceed those that actually can be used, errors of alignment can be reduced by nearly a factor of 2 by incorporating segments of a grating into the patterns. Under some conditions, resolution of the inspecting device need not limit accuracy of alignment. Bull's-eye patterns may be optimal for visual alignment.
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