A path to ultranarrow patterns using self-assembled lithography.

Area of Science:

• Materials Science
• Nanotechnology
• Polymer Chemistry

Background:

• Block copolymer (BCP) self-assembly is crucial for creating nanoscale patterns.
• Achieving high ordering, registration, and pattern transfer for features below 10 nm remains challenging.

Purpose of the Study:

• To establish methods for forming highly ordered sub-10-nm grating patterns using BCP thin films.
• To demonstrate hierarchical registration of BCP patterns for diverse geometries and precise control.
• To fabricate sub-10-nm nanowires from these self-assembled BCP patterns.

Main Methods:

• Utilized solvent-annealing and templating techniques with poly(styrene-b-dimethylsiloxane) (PS-PDMS) diblock copolymers.
• Employed hierarchical registration of BCP patterns for improved pattern control.
• Applied reactive ion etching for pattern transfer to create nanowires.

Main Results:

• Successfully formed highly ordered grating patterns with 8-nm line width and 17-nm period.
• Demonstrated hierarchical registration enabling complex pattern geometries and precise alignment.
• Fabricated sub-10-nm tungsten nanowires with excellent order and uniformity.

Conclusions:

• Developed effective methods for sub-10-nm feature fabrication using BCP self-assembly.
• Hierarchical registration offers a pathway to diversify nanoscale pattern geometries and enhance precision.
• The process is suitable for fabricating high-quality, uniform sub-10-nm nanowires.