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Updated: Jun 16, 2026

Optimized Fabrication Procedure for High-Quality Graphene-based Moiré Superlattice Devices
Published on: July 11, 2025
Atomic resolution imaging and topography of boron nitride sheets produced by chemical exfoliation
Jamie H Warner1, Mark H Rümmeli, Alicja Bachmatiuk
1Department of Materials, University of Oxford, Parks Rd, Oxford OX13PH, United Kingdom. jamie.warner@materials.ox.ac.uk
Abstract:
Here, we present a simple method for preparing thin few-layer sheets of hexagonal BN with micrometer-sized dimensions using chemical exfoliation in the solvent 1,2-dichloroethane. The atomic structure of both few-layer and monolayer BN sheets is directly imaged using aberration-corrected high-resolution transmission electron microscopy. Electron beam induced sputtering effects are examined in real time. The removal of layers of BN by electron beam irradiation leads to the exposure of a step edge between a monolayer and bilayer region. We use HRTEM imaging combined with image simulations to show that BN bilayers can have AB stacking and are not limited to just AA stacking.

