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Step-and-repeat process for thermal nanoimprint lithography.

Hyunsik Yoon1, Hye Sung Cho, Kahp Y Suh

  • 1School of Chemical and Biological Engineering, The WCU Program of Chemical Convergence for Energy and Environment, Seoul National University, Seoul 151-744, Korea.

Nanotechnology
|February 16, 2010
PubMed
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A novel step-and-repeat thermal nanoimprint lithography process selectively heats polystyrene using infrared rays. This method enables precise pattern transfer by preventing pattern collapse through controlled heat dissipation.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Lithography

Background:

  • Thermal nanoimprint lithography (T-NIL) is a key nanofabrication technique.
  • Achieving high resolution and pattern fidelity in T-NIL remains challenging.
  • Selective heating is crucial for precise pattern transfer and defect reduction.

Purpose of the Study:

  • To develop a step-and-repeat process for thermal nanoimprint lithography.
  • To enable selective heating and imprinting on a polystyrene layer.
  • To prevent pattern collapse during the nanoimprinting process.

Main Methods:

  • Utilized a step-and-repeat method with infrared (IR) irradiation.
  • Employed a spin-coated polystyrene layer and a transparent polymer mold.

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  • Applied a metal-covered glass for selective heating and a copper block heat sink.

    • Main Results:

    • Successfully demonstrated selective heating and imprinting using IR rays.
    • Achieved pattern transfer with controlled pressure (4 bar) and time (60-120 s).
    • Prevented pattern collapse via a heat sink, maintaining pattern integrity.

    Conclusions:

    • The developed step-and-repeat T-NIL process offers precise control over selective heating.
    • This technique is effective for high-resolution pattern transfer on polystyrene.
    • The integrated heat sink effectively mitigates pattern collapse, enhancing fabrication reliability.