Thin periodic structures in photoresist: fabrication and experimental evaluation

In this paper we discuss the experimental verification of an empirical photoresist model presented previously. Photoresist grating depths predicted by the model are found to be in good agreement with those obtained from diffraction efficiency measurements. Total rates of field decay alpha(T) obtained from a theoretical analysis of the photoresist grating coupler predicted by the model are also in good agreement with values measured by two independent experimental techniques. These results indicate the usefulness of the model in fabricating periodic devices in photoresist.