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Updated: Jun 15, 2026

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

Probing the oxygen environment in UO(2)(2+) by solid-state 17O nuclear magnetic resonance spectroscopy and

Herman Cho1, Wibe A de Jong, Chuck Z Soderquist

  • 1Fundamental and Computational Sciences Directorate, Pacific Northwest National Laboratory, P. O. Box 999, Richland, Washington 99352, USA. hm.cho@pnl.gov

The Journal of Chemical Physics
|March 3, 2010
PubMed

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