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Laser ion source: a direct plasma injection scheme for two-beam type interdigital-H radio frequency quadrupole linac
T Ishibashi1, N Hayashizaki, J Tamura
1Tokyo Institute of Technology, 2-12-1, O-okayama, Meguro-ku, Tokyo 152-8550, Japan. ishibashi.t.aa@m.titech.ac.jp
Abstract:
We developed a laser ion source using a direct plasma injection scheme (DPIS) as an injection system for a two-beam type radio frequency quadrupole (RFQ) linac with an interdigital-H (IH) type cavity. The laser ion source in the DPIS is directly connected to the RFQ cavity without the low energy beam transport system. We achieved a high current C(2+) beam above 60 mA per beam channel from the ion source. The beam will be injected to the two-beam type IH-RFQ linac, and the linac will generate a beam current of approximately 44 mA per beam channel.
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