Related Experiment Video
Updated: Jun 15, 2026

Preparing an Isotopically Pure 229Th Ion Beam for Studies of 229mTh
Published on: May 3, 2019
A self-sputtering ion source: a new approach to quiescent metal ion beams
1High Current Electronics Institute, Russian Academy of Sciences, 2/3 Academichesky Ave., Tomsk 634055, Russia.
Abstract:
A new metal ion source is presented based on sustained self-sputtering plasma in a magnetron discharge. Metals exhibiting high self-sputtering yield such as Cu, Ag, Zn, and Bi can be used in a high-power impulse magnetron sputtering discharge such that the plasma almost exclusively contains singly charged metal ions of the target material. The plasma and extracted ion beam are quiescent. The ion beams consist mostly of singly charged ions with a space-charge limited current density which reached about 10 mA/cm(2) at an extraction voltage of 45 kV and a first gap spacing of 12 mm.
Related Concept Videos
Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle
The ions and electrons produced interact with the fluctuating magnetic field created by a water-cooled...
Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview
Atomic Emission Spectroscopy: Overview
Atomic Absorption Spectroscopy: Radiation and Light Sources
Two common narrow-range 'line' sources used in AAS are hollow-cathode lamps (HCLs) and...
Atomic Emission Spectroscopy: Lab
Chemical Ionization (CI) Mass Spectrometry
