Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle01:19

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle

Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
The ions and electrons produced interact with the fluctuating magnetic field created by a water-cooled...
Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview01:19

Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview

In inductively coupled plasma–mass spectrometry (ICP–MS), an inductively coupled plasma (ICP) torch is used as an atomizer and ionizer. Solid samples are dissolved and volatilized before being introduced into the high-temperature argon plasma, while solution samples are nebulized and passed through the high-temperature argon plasma. Plasma dissociates the analytes and ionizes their component atoms to form a mixture of positive ions and molecular species. The positive ions are then passed on to...
Atomic Emission Spectroscopy: Lab01:29

Atomic Emission Spectroscopy: Lab

AES is a powerful analytical technique, especially effective when used with plasma sources, producing abundant spectra in characteristic emission lines. The Inductively Coupled Plasma (ICP), in particular, yields superior quantitative analytical data due to its high stability, low noise, low background, and minimal interferences under optimal experimental conditions. However, newer air-operated microwave sources are emerging as promising alternatives that could be more cost-effective than...
Extraction: Advanced Methods00:56

Extraction: Advanced Methods

Metal ions can be separated from one another by complexation with organic ligands–the chelating agent– to form uncharged chelates. Here, the chelating agent must contain hydrophobic groups and behave as a weak acid, losing a proton to bind with the metal. Since most organic ligands used in this process are insoluble or undergo oxidation in the aqueous phase, the chelating agent is initially added to the organic phase and extracted into the aqueous phase. The metal-ligand complex is formed in...
Ion-Exchange Chromatography01:09

Ion-Exchange Chromatography

Ion-exchange chromatography, or IEC, is a technique for separating ions based on their affinity for the stationary phase. The stationary phase is a cross-linked polymer resin with covalently attached ionic functional groups. The functional groups can be either positively charged (cation exchangers) or negatively charged (anion exchangers). A cation exchanger consists of a polymeric anion and active cations, while an anion exchanger is a polymeric cation with active anions. The choice of...
Atomic Emission Spectroscopy: Instrumentation01:22

Atomic Emission Spectroscopy: Instrumentation

The instrumentation of atomic emission spectrometry (AES) involves various components, including atomization devices that convert samples into gas-phase atoms and ions. There are two main types of atomization devices: continuous and discrete atomizers.  Continuous atomizers, like plasmas and flames, introduce samples in a constant stream, while discrete atomizers inject individual samples using syringes or autosamplers. The most common discrete atomizer is the electrothermal atomizer.

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Refractory epilepsy associated with anti-ribosomal P antibodies successfully treated with topiramate.

Journal of neuroimmunology·2020
Same author

A high-sensitivity and low dose energy-dispersive X-ray fluorescence system for identification of gadolium accumulations in planar X-ray fluorescence images.

Applied radiation and isotopes : including data, instrumentation and methods for use in agriculture, industry and medicine·2019
Same author

Inhibiting Human Parainfluenza Virus Infection by Preactivating the Cell Entry Mechanism.

mBio·2019
Same author

Prevalence of eosinophilic esophagitis: A multicenter study on a pediatric population evaluated at thirty-six Latin American gastroenterology centers.

Revista de gastroenterologia de Mexico (English)·2018
Same author

Relationship between Social Cognition and traditional cognitive impairment in Progressive Multiple Sclerosis and possible implicated neuroanatomical regions.

Multiple sclerosis and related disorders·2018
Same author

Optimization of the sensitivity/doses relationship for a bench-top EDXRF system used for in vivo quantification of gold nanoparticles.

Applied radiation and isotopes : including data, instrumentation and methods for use in agriculture, industry and medicine·2017

Related Experiment Video

Updated: Jun 15, 2026

Preparing an Isotopically Pure 229Th Ion Beam for Studies of 229mTh
10:42

Preparing an Isotopically Pure 229Th Ion Beam for Studies of 229mTh

Published on: May 3, 2019

Gallium ion extraction from a plasma sputter-type ion source.

M Vasquez1, S Imakita, T Kasuya

  • 1Graduate School of Engineering, Doshisha University, Kyotanabe, Kyoto 610-0321, Japan. eti1106@mail4.doshisha.ac.jp

The Review of Scientific Instruments
|March 3, 2010
PubMed
Summary

Researchers developed a mixed ion beam with gallium (Ga) using a plasma sputter-type ion source. This method efficiently produces Ga(+) ions for potential applications in materials science and ion implantation.

More Related Videos

Automated Preparation of [68Ga]Ga-3BP-3940 on a Synthesis Module for PET Imaging of the Tumor Microenvironment
10:33

Automated Preparation of [68Ga]Ga-3BP-3940 on a Synthesis Module for PET Imaging of the Tumor Microenvironment

Published on: April 25, 2025

Investigations on the Ga(III) Complex of EOB-DTPA and Its 68Ga Radiolabeled Analogue
11:22

Investigations on the Ga(III) Complex of EOB-DTPA and Its 68Ga Radiolabeled Analogue

Published on: August 17, 2016

Related Experiment Videos

Last Updated: Jun 15, 2026

Preparing an Isotopically Pure 229Th Ion Beam for Studies of 229mTh
10:42

Preparing an Isotopically Pure 229Th Ion Beam for Studies of 229mTh

Published on: May 3, 2019

Automated Preparation of [68Ga]Ga-3BP-3940 on a Synthesis Module for PET Imaging of the Tumor Microenvironment
10:33

Automated Preparation of [68Ga]Ga-3BP-3940 on a Synthesis Module for PET Imaging of the Tumor Microenvironment

Published on: April 25, 2025

Investigations on the Ga(III) Complex of EOB-DTPA and Its 68Ga Radiolabeled Analogue
11:22

Investigations on the Ga(III) Complex of EOB-DTPA and Its 68Ga Radiolabeled Analogue

Published on: August 17, 2016

Area of Science:

  • Plasma Physics
  • Materials Science
  • Ion Beam Technology

Background:

  • Gallium (Ga) ion beams are crucial for various applications, including semiconductor fabrication and surface modification.
  • Efficient production of mixed ion beams requires optimized plasma and sputtering conditions.

Purpose of the Study:

  • To develop a method for producing a broad mixed ion beam containing positive gallium (Ga) ions.
  • To investigate the parameters influencing Ga ion generation and extraction.

Main Methods:

  • Utilized a plasma sputter-type ion source with liquid Ga on a tungsten reservoir.
  • Employed radio frequency (rf) power to excite argon (Ar) plasma for sputtering and postionization.
  • Analyzed plasma emission spectra and used a quadrupole mass analyzer to quantify ion ratios.

Main Results:

  • Successfully produced a mixed ion beam containing Ga(+) ions.
  • Observed that increasing negative bias on the sputtering target enhanced Ga release into the plasma.
  • Achieved a Ga(+) to Ar(+) current ratio of approximately 1% at 30 W rf power and 100 V extraction voltage.

Conclusions:

  • The developed plasma sputter-type ion source is effective for generating mixed ion beams with Ga(+) ions.
  • Optimizing sputtering target bias and rf power are key to enhancing Ga ion production.
  • The method shows promise for applications requiring controlled Ga ion delivery.