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Related Experiment Video

Updated: Jun 15, 2026

Quantitative Atomic-Site Analysis of Functional Dopants/Point Defects in Crystalline Materials by Electron-Channeling-Enhanced Microanalysis
07:24

Quantitative Atomic-Site Analysis of Functional Dopants/Point Defects in Crystalline Materials by Electron-Channeling-Enhanced Microanalysis

Published on: May 10, 2021

Fundamental electron-precursor-solid interactions derived from time-dependent electron-beam-induced deposition

Jason D Fowlkes1, Philip D Rack

  • 1Nanofabrication Research Laboratory, Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37381-6487, USA. fowlkesjd@ornl.gov

ACS Nano
|March 6, 2010
PubMed
Summary

Researchers quantified critical parameters for electron-beam-induced deposition (EBID), including precursor surface diffusion, sticking probability, and residence time for tungsten hexacarbonyl. This advances control over nanoscale directed assembly methods.

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Last Updated: Jun 15, 2026

Quantitative Atomic-Site Analysis of Functional Dopants/Point Defects in Crystalline Materials by Electron-Channeling-Enhanced Microanalysis
07:24

Quantitative Atomic-Site Analysis of Functional Dopants/Point Defects in Crystalline Materials by Electron-Channeling-Enhanced Microanalysis

Published on: May 10, 2021

Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Science

Background:

  • Electron-beam-induced deposition (EBID) is a nanoscale directed assembly method with limited control due to unknown electron-precursor-substrate interactions.
  • Understanding precursor dynamics on surfaces is crucial for controlling EBID processes and deposit morphology.

Purpose of the Study:

  • To determine critical parameters governing precursor-solid interactions in EBID.
  • To quantify the precursor surface diffusion coefficient (D), sticking probability (delta), and mean surface residence time (tau) for tungsten hexacarbonyl (W(CO)6).
  • To develop a predictive model for adsorbed precursor coverage and nanopillar morphology during EBID.

Main Methods:

  • Experimental determination of D, delta, and tau for W(CO)6.
  • Numerical simulation using explicit finite differencing to solve for adsorbed precursor coverage.
  • Modeling nanopillar surface morphology evolution considering electron-induced dissociation as the primary depletion mechanism.

Main Results:

  • Quantified values for W(CO)6: D = 6.4 microm(2) s(-1), delta = 0.0250, and tau = 3.20 ms.
  • Simulations accurately predicted adsorbed precursor coverage and evolving nanopillar morphology.
  • Inferred space- and time-dependent precursor coverage dynamics around nanopillars.

Conclusions:

  • The determined parameters provide essential insights into precursor surface dynamics during EBID.
  • Understanding these parameters enables better control over EBID processes, distinguishing between mass-transport-limited (MTL) and reaction-rate-limited (RRL) regimes.
  • This work advances the capability for precise nanoscale directed assembly using EBID.