Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

Instrument Calibration01:12

Instrument Calibration

Instrument calibration is essential for ensuring that instruments produce accurate and consistent results. It is vital in manufacturing, healthcare, testing laboratories, and scientific research. Calibration processes are specific to each instrument and help enhance data accuracy. Each instrument has a unique calibration process tailored to its design and function to improve data accuracy.
Analytical Balance Calibration
An analytical balance measures mass and requires regular calibration to...
Glassware Calibration01:11

Glassware Calibration

Accurate calibration of glassware, such as volumetric flasks, pipettes, and burettes, is essential to ensure accurate measurements in the analytical laboratory. Calibration helps maintain consistency across measurements and prevents errors arising from inaccurate volumes.
Volumetric flasks: Volumetric flasks are designed to prepare aqueous solutions of precise volumes accurately with a calibration line on the neck. To calibrate a volumetric flask, it is important to fill it with distilled...
Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used.
Calibration Curves: Linear Least Squares01:20

Calibration Curves: Linear Least Squares

A calibration curve is a plot of the instrument's response against a series of known concentrations of a substance. This curve is used to set the instrument response levels, using the substance and its concentrations as standards. Alternatively, or additionally, an equation is fitted to the calibration curve plot and subsequently used to calculate the unknown concentrations of other samples reliably.
For data that follow a straight line, the standard method for fitting is the linear...
Leveling Equipment01:18

Leveling Equipment

As leveling involves measuring vertical distances relative to a horizontal line of sight, it requires a graduated rod, called a level rod, for vertical measurements and an instrument called a level for a horizontal sight line. A level includes a high-powered telescope with a mechanism for leveling to ensure the line of sight is horizontal when the bubble in the spirit level is centered. Leveling rods, made of wood, metal, or fiberglass, are graduated in feet or meters and commonly used in two-...
Atomic Absorption Spectroscopy: Lab01:21

Atomic Absorption Spectroscopy: Lab

For AAS measurements, samples must be introduced as clear solutions, often requiring extensive preliminary treatment to dissolve materials like soils, animal tissues, and minerals. Common methods for sample preparation include treatment with hot mineral acids, wet ashing, combustion in closed containers, high-temperature ashing, or fusion with reagents.
 Solutions containing organic solvents, such as low-molecular-mass alcohols, esters, or ketones, enhance absorbances by increasing nebulizer...

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Production of high-quality V-coatings.

Applied optics·2010
Same author

Fast computation method for derivatives of multilayer stack reflectance.

Applied optics·2010
Same journal

Multifunctional reconfigurable terahertz metasurface based on vanadium dioxide phase transition: achieving broadband absorption and efficient polarization conversion.

Applied optics·2026
Same journal

High-Q-factor electromagnetically induced transparency utilizing quasi-bound states in the continuum in an all-dielectric terahertz metasurface.

Applied optics·2026
Same journal

Automated stitching interferometry for high-precision metrology of X-ray mirrors.

Applied optics·2026
Same journal

Experimental demonstration of an approach to designing a metal-dielectric DBR resonant cavity structure.

Applied optics·2026
Same journal

High-precision wavefront reconstruction from a single-shot interferogram using a physics-driven hybrid feature calibration network.

Applied optics·2026
Same journal

Ultra-high-Q Fano resonance based on coupled topological corner states in Kagome photonic crystals.

Applied optics·2026
See all related articles

Related Experiment Video

Updated: Jun 15, 2026

A Stable Phantom Material for Optical and Acoustic Imaging
04:54

A Stable Phantom Material for Optical and Acoustic Imaging

Published on: June 16, 2023

Calibration substrate for Abelès-equipment

C J Laan

    Applied Optics
    |March 6, 2010
    PubMed
    Summary

    No abstract available in PubMed .

    More Related Videos

    Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
    11:14

    Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope

    Published on: May 28, 2016

    Related Experiment Videos

    Last Updated: Jun 15, 2026

    A Stable Phantom Material for Optical and Acoustic Imaging
    04:54

    A Stable Phantom Material for Optical and Acoustic Imaging

    Published on: June 16, 2023

    Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
    11:14

    Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope

    Published on: May 28, 2016