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08:48
Writing Bragg Gratings in Multicore Fibers
Published on: April 20, 2016
Direct writing of optical gratings using a scanning electron microscope
Applied Optics
|March 6, 2010
Summary
Electron beam irradiation induces refractive-index changes, enabling direct writing of large optical gratings in amorphous chalcogenide films. This method utilizes a standard scanning electron microscope for fabrication and characterization.
Area of Science:
- Materials Science
- Optics
- Nanotechnology
Background:
- Amorphous chalcogenide films exhibit photosensitivity.
- Electron beam irradiation can alter material properties.
Purpose of the Study:
- To demonstrate direct writing of optical gratings using electron beam irradiation.
- To investigate the fabrication and optical characteristics of these gratings.
Main Methods:
- Utilizing a scanning electron microscope (SEM) for direct writing.
- Irradiating amorphous chalcogenide films (e.g., As2S3, As40Se10S40Ge10) with an electron beam.
- Fabricating optical gratings with periods of 0.5-2 micrometers and dimensions up to 0.5 x 0.65 mm2.
Main Results:
- Successfully fabricated large-area optical gratings directly via electron beam irradiation.
- Achieved grating periods ranging from 0.5 to 2 micrometers.
- Demonstrated the refractive-index change effect for grating formation.
Conclusions:
- Electron beam irradiation is an effective method for fabricating optical gratings in chalcogenide films.
- The technique allows for direct writing of micro- and nanostructured optical elements.
- Further research can explore advanced optical device applications.
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