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Deep UV photochemistry of chemisorbed monolayers: patterned coplanar molecular assemblies
C S Dulcey1, J H Georger, V Krauthamer
1Geo-Centers, Inc., Fort Washington, MD 20744.
Science (New York, N.Y.)
|April 26, 1991
Abstract:
Deep ultraviolet (UV) irradiation is shown to modify organosilane self-assembled monolayer (SAM) films by a photocleavage mechanism, which renders the surface amenable to further SAM modification. Patterned UV exposure creates alternating regions of intact SAM film and hydrophilic, reactive sites. The exposed regions can undergo a second chemisorption reaction to produce an assembly of SAMs in the same molecular plane with similar substrate attachment chemistry. The UV-patterned films are used as a template for selective buildup of fluorophores, metals, and biological cells.