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Related Experiment Video

Updated: Jun 15, 2026

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
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Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

Published on: June 12, 2018

Serial and parallel dip-pen nanolithography using a colloidal probe tip.

Marcus A Kramer1, Hamsa Jaganathan, Albena Ivanisevic

  • 1Weldon School of Biomedical Engineering, Department of Chemistry, Purdue University, West Lafayette, Indiana 47907, USA.

Journal of the American Chemical Society
|March 16, 2010
PubMed
Summary
This summary is machine-generated.

Atomic force microscopy tips coated with PMMA colloids enable serial and parallel molecular patterning. This dip-pen nanolithography advancement simplifies ink placement on substrates without complex tip alignment.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Chemistry

Background:

  • Dip-pen nanolithography (DPN) is a powerful technique for nanoscale patterning.
  • Conventional DPN often requires precise tip alignment and specialized ink formulations.

Purpose of the Study:

  • To develop an enhanced DPN method for simplified molecular patterning.
  • To enable both serial and parallel patterning using a novel tip modification.

Main Methods:

  • Atomic force microscopy (AFM) tips were functionalized with polymer chains of poly(methyl methacrylate) (PMMA) colloids.
  • The swelling behavior of PMMA under varying humidity conditions was utilized to control ink transfer.
  • Both serial (single tip) and parallel (multiple tips) patterning modes were demonstrated.

Main Results:

  • Successful patterning of molecules onto various substrates was achieved using the modified AFM tips.
  • The humidity-responsive swelling of PMMA allowed for controlled ink deposition.
  • The technique eliminated the need for specialized tip alignment procedures.

Conclusions:

  • The developed AFM-based nanolithography technique offers a user-friendly approach for molecular patterning.
  • This method extends the capabilities of DPN for diverse applications in materials science and nanotechnology.
  • The use of humidity-responsive polymer colloids simplifies the patterning process on different substrates.