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Updated: Jun 14, 2026

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
12:05

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

The effect of the equatorial environment on oxo-group silylation of the uranyl dication: a computational study

Ahmed Yahia1, Polly L Arnold, Jason B Love

  • 1Laboratoire de Physique et Chimie des Nano-objets, INSA, Université Paul Sabatier, 135 avenue de Rangueil, 31077 Toulouse Cedex, France.

Chemistry (Weinheim an Der Bergstrasse, Germany)
|March 20, 2010
PubMed

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