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Integrated Fresnel lens on thermally oxidized silicon substrate
Applied Optics
|March 24, 2010
Summary
Researchers created thin film Fresnel lenses using silicon nitride waveguides and etched silicon dioxide layers. This method offers good control over lens characteristics due to reproducible fabrication processes.
Area of Science:
- Optics and Photonics
- Materials Science
- Nanotechnology
Background:
- Thin film Fresnel lenses are crucial optical components.
- Fabrication of precise optical elements on silicon substrates is challenging.
- Waveguide layers are essential for controlling light propagation.
Purpose of the Study:
- To demonstrate the fabrication of thin film Fresnel lenses.
- To investigate the role of silicon dioxide top layers in lens performance.
- To achieve reproducible and controllable lens characteristics.
Main Methods:
- Utilizing silicon dioxide/silicon substrates.
- Growing a silicon nitride waveguide layer via low-pressure chemical vapor deposition (LPCVD).
- Chemically etching a silicon dioxide top layer to induce phase shifts.
Main Results:
- Successfully fabricated thin film Fresnel lenses.
- Observed saturation of lens characteristics with increasing silicon dioxide thickness.
- Demonstrated good reproducibility using LPCVD technology.
Conclusions:
- LPCVD enables reproducible fabrication of thin film Fresnel lenses.
- Chemically etched silicon dioxide layers provide controllable phase shifts.
- The developed method allows for precise control over lens characteristics.
