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Related Experiment Video

Updated: Jun 14, 2026

Fabrication of a Low-Cost, Fiber-Coupled, and Air-Spaced Fabry-Pérot Etalon
07:22

Fabrication of a Low-Cost, Fiber-Coupled, and Air-Spaced Fabry-Pérot Etalon

Published on: February 3, 2023

Parallelism maps for optically contacted etalons.

T L Killeen, P B Hays, J Devos

    Applied Optics
    |March 25, 2010
    PubMed
    Summary
    This summary is machine-generated.

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    A new technique accurately maps parallelism defects in Fabry-Perot etalons using photoelectric raster scans. This method reveals how mechanical constraints impact etalon parallelism, aiding optical instrument design.

    Area of Science:

    • Optical Metrology
    • Precision Engineering

    Background:

    • Fabry-Perot etalons are critical optical components.
    • Accurate parallelism is essential for etalon performance.
    • Quantifying parallelism defects has been challenging.

    Purpose of the Study:

    • To develop a precise measurement technique for etalon parallelism defects.
    • To create numerical and contour maps of these defects.
    • To investigate the influence of mechanical constraints.

    Main Methods:

    • Photoelectric raster scanning of etalon transmission intensity.
    • Performing scans at three specific etalon tunings (on-axis max and half-maxima).
    • Utilizing simple data manipulation for defect mapping.

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    05:57

    Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station

    Published on: April 1, 2020

    Related Experiment Videos

    Last Updated: Jun 14, 2026

    Fabrication of a Low-Cost, Fiber-Coupled, and Air-Spaced Fabry-Pérot Etalon
    07:22

    Fabrication of a Low-Cost, Fiber-Coupled, and Air-Spaced Fabry-Pérot Etalon

    Published on: February 3, 2023

    Patterning via Optical Saturable Transitions - Fabrication and Characterization
    08:19

    Patterning via Optical Saturable Transitions - Fabrication and Characterization

    Published on: December 11, 2014

    Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station
    05:57

    Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station

    Published on: April 1, 2020

    Main Results:

    • Accurate numerical and contour maps of parallelism defects were generated.
    • The study demonstrated the impact of mechanical constraints on etalon parallelism.
    • The technique proved effective for characterizing etalon quality.

    Conclusions:

    • The described technique provides quantitative assessment of etalon parallelism.
    • Understanding mechanical constraint effects is crucial for fabricating high-quality etalons.
    • This method advances the metrology of optical components.