Asymmetric triangular grating profiles with 90 degrees groove angles produced by ion-beam erosion

A simple phenomenological model has been developed to account for the effects of redeposition during transverse ion-beam erosion of grating relief patterns on surfaces. The model predicts the evolution with time of an inclined facet in the substrate, and the dependence of the facet angle theta(r) on angle of incidence of the ion beam, erosion rates of mask and substrate, and the geometrical parameters of the mask. The results are illustrated by calculation of the angular dependence of theta(r) for AZ-1350 photoresist masks on GaAs and SiO(2) substrates and for Ti on SiO(2). A strong dependence of theta(r) on mask intercept angle alpha is found, except for a limited range in angle of incidence of the ion beam. Combined with results derived previously, the facet angles theta(S) and theta(r) and the groove angle theta(g) of the asymmetric triangular groove profiles produced in these systems have been determined. A groove angle of 90 degrees cannot be obtained for AZ-1350 on GaAs and SiO(2), but in appropriate conditions a 90 degrees groove angle may be obtained in SiO(2) with a Ti mask.