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Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model
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In situ reaction mechanism studies on ozone-based atomic layer deposition of Al(2)O(3) and HfO(2)

Martin Rose, Jaakko Niinistö, Ingolf Endler

    ACS Applied Materials & Interfaces
    |April 2, 2010
    PubMed

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