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Updated: Jun 14, 2026

Demonstration of Equal-Intensity Beam Generation by Dielectric Metasurfaces

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Ion-implanted polymethyl methacrylate beam splitter/coupler for 1.55 microm applications.

Georgi B Hadjichristov¹, Ivan L Stefanov

¹Laboratory of Optics and Spectroscopy, Georgi Nadjakov Institute of Solid State Physics, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Boulevard, BG-1784 Sofia, Bulgaria. georgibh@issp.bas.bg

|April 2, 2010

Summary

Ion-implanted polymethyl methacrylate (PMMA) layers effectively split laser beams at telecommunication wavelengths (1.55 µm). This technique offers low absorption loss for optical applications.

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Area of Science:

Materials Science
Optoelectronics
Photonics

Background:

Polymethyl methacrylate (PMMA) is a versatile polymer with potential in optical applications.
Ion implantation is a technique used to modify material properties.
Laser beam splitting is crucial for various photonic and telecommunication systems.

Purpose of the Study:

To investigate the use of ion-implanted PMMA layers for laser beam splitting.
To evaluate the performance of these layers at the telecommunications wavelength of 1.55 µm.

Main Methods:

Bulk PMMA samples were subjected to low-energy silicon ion implantation.
Ion fluences ranged from 10^14 to 10^17 cm^-2.
Characterization of the resulting ultrathin near-surface ion-implanted layer (approx. 100 nm thickness, buried at 100 nm depth).

Main Results:

An ultrathin ion-implanted layer was successfully formed in PMMA.
This layer demonstrated applicability for splitting or combining laser beams.
Low absorption losses were observed at the 1.55 µm wavelength.

Conclusions:

Ion-implanted PMMA layers are a viable option for beam splitting applications.
The technique is suitable for the telecommunications wavelength of 1.55 µm.
This method offers a low-loss solution for optical beam manipulation.