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Updated: Jun 14, 2026

Implementation of a Hyperbolic Vortex Plasma Reactor for the Removal of Micropollutants in Water
Published on: July 25, 2025
Occurrence and removal of priority pollutants by lamella clarification and biofiltration
Johnny Gasperi1, Vincent Rocher, Solène Gilbert
1Université Paris-Est, LEESU, UMR MA 102, AgroParisTech, 61 avenue du Gal de Gaulle, 94010 Créteil Cedex, France. gasperi@univ-paris12.fr <gasperi@univ-paris12.fr>
Abstract:
This study investigates the occurrence of all priority substances (n = 41) listed in the Water Framework Directive and additional substances (n = 47) in raw sewage, as well as the removal performance of lamella clarification and biofiltration techniques. Once the efficiency of both types of techniques has been assessed for typical wastewater parameters, the differences in each technique's ability to remove pollutants becomes obvious; nevertheless, pollutant removal in quantitative terms still depends on the physico-chemical properties of the compounds used and operating conditions within the selected facility. For lamella clarification, the removal of organic chemicals was found to be primarily correlated with their sorption potential and, hence, strongly dependent upon log K(ow) of the compound under study. Compounds with a strong hydrophobic character (log K(ow) > 4.5) are removed to a significant extent (approx. 85%), while hydrophilic compounds (log K(ow) < 3.5) are poorly removed (<20%). For biofiltration, the removal of chemicals appears to be compound-dependent, although this outcome involves several mechanisms, namely: i) physical filtration of total suspended solids, ii) volatilisation, iii) sorption, and iv) biotransformation of substances. Even if the complex processes within a biofilter system do not yield an accurate prediction of pollutant removal, two groups of chemicals can still be clearly identified: i) hydrophobic or volatile compounds, for which moderate to high removal rates are observed (from 50% to over 80%); and ii) hydrophilic, non-volatile and refractory compounds for which a low removal rate would be expected (<20%).
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