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Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source
Frank Barkusky1, Armin Bayer, Stefan Döring
1Laser-Laboratorium-Göttingen eV, Hans-Adolf-Krebs-Weg 1, D-37077 Göttingen, Germany. frank.barkusky@llg-ev.de
Optics Express
|April 15, 2010
Summary
This study details the first damage threshold investigations on EUV mirrors and substrates using a novel laser plasma source. Silicon demonstrated the highest damage threshold among tested materials, indicating its potential for extreme ultraviolet applications.
Area of Science:
- Materials Science
- Optics
- Laser Physics
Background:
- Extreme ultraviolet (EUV) optics require high damage thresholds for reliable operation.
- Understanding material responses to EUV radiation is crucial for developing advanced optical components.
Purpose of the Study:
- To investigate the single-pulse laser-induced damage thresholds of EUV mirror coatings and substrate materials.
- To characterize damage mechanisms under EUV irradiation using a table-top laser-produced plasma source.
Main Methods:
- Utilized a table-top laser-produced plasma source generating 13.5 nm EUV radiation.
- Employed a Schwarzschild objective to focus EUV onto mirror samples, achieving energy densities up to 6.6 J/cm².
- Performed single-pulse damage tests on gold mirrors, Mo/Si multilayer mirrors, and various substrates (fused silica, silicon, CaF₂).
Main Results:
- Observed a film thickness dependent damage threshold for gold mirrors, consistent with thermal interaction.
- Identified two damage regimes (spot-like and crater) for Mo/Si multilayer mirrors.
- Fused silica showed smooth ablation craters, suggesting direct photon-induced bond breaking; silicon exhibited the highest damage threshold among all tested materials.
Conclusions:
- Silicon is a promising substrate material for EUV optics due to its high damage threshold.
- The study provides critical data for the design and application of EUV optical components, informing material selection and processing.
- Comparison with 157 nm excimer laser ablation data offers insights into wavelength-dependent material behavior.
