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Measurement of influence function using swing arm profilometer and laser tracker.

Hongwei Jing¹, Christopher King, David Walker

¹Institute of Optics and Electronics, Chinese Academy of Sciences, PO Box 350, Chengdu 610209, China. hwjing@ioe.ac.cn

|April 15, 2010

Summary

A new swing arm profilometer (SAP) method accurately measures 3D polishing influence functions. This technique offers a viable alternative for larger functions beyond commercial instrument range.

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Area of Science:

Metrology
Surface finishing
Optical engineering

Background:

Accurate measurement of 3D polishing influence functions is critical for precision manufacturing.
Existing commercial profilometers have limitations in measuring larger or complex influence functions.

Purpose of the Study:

To introduce and validate a novel method for measuring 3D polishing influence functions using a swing arm profilometer (SAP) and a laser tracker.
To assess the accuracy and reliability of the SAP method by comparing its results with a commercial 3D profilometer.

Main Methods:

Utilized a laser tracker for precise alignment and parameter measurement of the swing arm profilometer setup.
Described the instruments and measurement procedure, including a detailed uncertainty analysis.
Measured a deliberately asymmetric influence function to challenge the system.

Main Results:

The SAP method yielded an influence function of 48.2 microm in peak-to-valley (PV) and 7.271 mm³ in volume.
A commercial 3D profilometer measured the same function as 48.4 microm in PV and 7.289 mm³ in volume.
Excellent correlation was observed between the SAP and commercial profilometer results for the tested influence function.

Conclusions:

The swing arm profilometer (SAP) method provides accurate measurements of 3D polishing influence functions.
The SAP method demonstrates viability for measuring larger influence functions that exceed the capabilities of commercial instruments.
This novel approach enhances precision manufacturing capabilities in optical and other high-precision fields.