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Fabrication and Operation of a Nano-Optical Conveyor Belt

Fabrication and Operation of a Nano-Optical Conveyor Belt

Published on: August 26, 2015

Parallel optical nanolithography using nanoscale bowtie aperture array.

Sreemanth M V Uppuluri¹, Edward C Kinzel, Yan Li

¹School of Mechanical Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, IN 47906,USA.

|April 15, 2010

Summary

This study demonstrates parallel optical nanolithography using nanoscale bowtie aperture arrays to create multiple laser spots for sub-100nm feature fabrication. This technique enables efficient, high-resolution nanoscale direct-writing on photoresist surfaces.

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Area of Science:

Optics and Photonics
Materials Science
Nanotechnology

Background:

Optical nanolithography is crucial for fabricating nanoscale features.
Existing methods can be limited by throughput and resolution.
Parallel processing offers a path to increased efficiency.

Purpose of the Study:

To demonstrate parallel optical nanolithography using nanoscale bowtie aperture arrays.
To achieve sub-100nm feature resolution in parallel.
To investigate the application of bowtie apertures for focused light manipulation.

Main Methods:

Utilized nanoscale bowtie aperture arrays for laser beam focusing.
Employed a frequency-tripled diode-pumped solid-state (DPSS) laser at lambda = 355 nm.

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Used Shipley S1805 photoresist and an interference-based optical alignment system.

Main Results:

Successfully focused a laser beam into multiple nanoscale light spots.
Achieved parallel nano-lithography with nanoscale bowtie aperture arrays.
Demonstrated nanoscale direct-writing of sub-100nm features in photoresist.

Conclusions:

Nanoscale bowtie aperture arrays are effective for parallel optical nanolithography.
The developed method enables efficient fabrication of sub-100nm features.
This approach holds promise for high-throughput nanoscale manufacturing.