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Low-loss GeO(2) optical waveguide fabrication using low deposition rate rf sputtering.

Z Y Yin, B K Garside

    Applied Optics
    |April 20, 2010
    PubMed
    Summary

    Researchers developed low-loss germanium dioxide (GeO2) thin-film optical waveguides. Optimized radio frequency (RF) sputtering and annealing significantly reduced propagation losses, enabling use across visible to near-infrared wavelengths.

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    Area of Science:

    • Materials Science
    • Optoelectronics
    • Photonics

    Background:

    • Optical waveguides are crucial for photonic integrated circuits.
    • Achieving low propagation loss in thin-film waveguides is a key challenge.
    • Germanium dioxide (GeO2) is a promising material for optical applications.

    Purpose of the Study:

    • To prepare low-loss GeO2 thin-film optical waveguides.
    • To investigate the impact of fabrication conditions on waveguide properties.
    • To determine the suitability of GeO2 waveguides for a wide wavelength range.

    Main Methods:

    • Radio frequency (RF) reactive sputtering using a GeO2 target in an argon-oxygen atmosphere.
    • Optimization of deposition rate and annealing processes.
    • Ellipsometry for refractive index measurement.
    • Propagation loss measurements at various wavelengths.

    Main Results:

    • Low propagation losses (<0.7 dB/cm for TE0 mode at 0.63 microm) were achieved.
    • Waveguide attenuation significantly decreased with low deposition rates and appropriate annealing.
    • The refractive index of GeO2 films was measured to be 1.6059 at 5461 A.
    • GeO2 waveguides demonstrated low losses across visible to near-infrared wavelengths.

    Conclusions:

    • Optimized RF sputtering and annealing are effective for fabricating low-loss GeO2 thin-film optical waveguides.
    • GeO2 thin-film waveguides exhibit excellent optical properties suitable for broad wavelength applications.
    • These findings support the use of GeO2 in advanced photonic devices.