Nanoimprint-induced molecular stacking and pattern stabilization in a solution-processed subphthalocyanine film

Xiaogan Liang1, Teresa Chen, Yeon-Sik Jung

  • 1Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA. xliang@lbl.gov

ACS Nano
|April 24, 2010
PubMed
Summary

Optimizing thermal nanoimprinting of organic photovoltaics (OPV) materials like SubPc-A requires precise temperature control. Specific temperatures (80-90°C) enhance molecular stacking and stabilize nanoimprinted features for better performance.

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