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Photoluminescence: Applications

Photoluminescence offers a wide range of applications due to its inherent sensitivity and selectivity. This technique allows for both direct and indirect analyses of the analyte. Direct quantitative analysis is possible when the analyte exhibits a favorable quantum yield for fluorescence or phosphorescence. However, an indirect analysis may be feasible if the analyte is not fluorescent or phosphorescent, or if the quantum yield is unfavorable. Indirect methods include reacting the analyte with...
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Related Experiment Video

Updated: Jun 13, 2026

High-resolution Thermal Micro-imaging Using Europium Chelate Luminescent Coatings
09:01

High-resolution Thermal Micro-imaging Using Europium Chelate Luminescent Coatings

Published on: April 16, 2017

CVD Lu(2)O(3):Eu coatings For Advanced Scintillators.

Stephen G Topping1, V K Sarin

  • 1Materials Science and Engineering, Boston University, Brookline, MA 02446, USA.

International Journal of Refractory Metals & Hard Materials
|April 27, 2010
PubMed
Summary

Chemical vapor deposition (CVD) offers a viable alternative for manufacturing lutetium oxide (Lu(2)O(3):Eu(3+)) scintillators. This new method enables tailored sub-micron columnar growth for ultra-high resolution X-ray imaging applications.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Solid State Physics

Background:

  • Lutetium oxide (Lu(2)O(3):Eu(3+)) scintillators are crucial for X-ray imaging.
  • Current fabrication methods like hot-pressing and pixelization are not commercially viable.
  • Restricted commercial viability limits the widespread application of these scintillators.

Purpose of the Study:

  • To develop an alternative, commercially viable manufacturing process for Lu(2)O(3):Eu(3+) scintillators.
  • To demonstrate the feasibility of chemical vapor deposition (CVD) for producing high-quality Lu(2)O(3):Eu(3+) coatings.
  • To achieve tailored sub-micron columnar growth for enhanced imaging resolution.

Main Methods:

  • Chemical Vapor Deposition (CVD) using a halide-CO(2)-H(2) system.

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  • High-resolution scanning electron microscopy (SEM) for structural characterization.
  • X-ray diffraction (XRD) analysis for crystallographic and orientation studies.

    • Main Results:

    • Successful fabrication of columnar Lu(2)O(3):Eu(3+) coatings via CVD.
    • Optimization of process parameters leading to highly oriented coating structures.
    • Demonstrated ability to tailor sub-micron columnar growth of Lu(2)O(3):Eu(3+).

    Conclusions:

    • CVD is a feasible and promising method for manufacturing Lu(2)O(3):Eu(3+) scintillators.
    • The developed CVD process allows for precise control over coating microstructure.
    • This technology holds potential for advancing ultra-high resolution X-ray imaging.