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Updated: Jun 13, 2026

Synthesis, Functionalization, and Characterization of Fusogenic Porous Silicon Nanoparticles for Oligonucleotide Delivery

Synthesis, Functionalization, and Characterization of Fusogenic Porous Silicon Nanoparticles for Oligonucleotide Delivery

Published on: April 16, 2019

Xe interacting with porous silicon.

Assaf Paldor¹, Gil Toker, Yigal Lilach

¹Institute of Chemistry and the Farkas Center for Light Induced Processes, The Hebrew University of Jerusalem, 91904, Israel.

Physical Chemistry Chemical Physics : PCCP

|May 1, 2010

Summary

This summary is machine-generated.

Porous silicon (PS) inner pore structure was investigated using xenon Temperature Programmed Desorption (TPD). Unique double-peak TPD spectra reveal a surface-diffusion adsorption mechanism, suggesting TPD as a sensitive tool for surface area determination.

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Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

Published on: February 8, 2022

Area of Science:

Materials Science
Surface Science
Nanotechnology

Background:

Porous silicon (PS) is a nanomaterial with a complex internal pore structure.
Characterizing the intricate pore network of PS is crucial for understanding its properties and applications.
Traditional methods may not fully capture the depth-dependent characteristics of porous materials.

Purpose of the Study:

To investigate the pore structure of porous silicon (PS) thin films.
To utilize xenon (Xe) Temperature Programmed Desorption (TPD) as a probe for inner pore characterization.
To elucidate the adsorption and desorption mechanisms within PS pores.

Main Methods:

Structural characterization of porous silicon thin films using High-Resolution Scanning Electron Microscopy (HR-SEM).
Xenon (Xe) Temperature Programmed Desorption (TPD) experiments to probe the inner pore environment.
Mild Neon (Ne+) sputtering prior to TPD to differentiate surface and depth populations.

Main Results:

Observed unique double-peak structures in Xe TPD curves from porous silicon.
Proposed a surface-diffusion assisted adsorption mechanism into inner pores at 48 K as the origin of the double-peak spectra.
Experimental verification using Ne+ sputtering confirmed the role of surface vs. depth Xe populations.
Developed a pore-diameter limited desorption kinetic model that accurately explains the experimental observations.

Conclusions:

The unique TPD spectra are attributed to geometric hindrance and multiple wall collisions within the PS pores.
The study validates the proposed surface-diffusion assisted adsorption mechanism.
Temperature Programmed Desorption (TPD) shows potential as a highly sensitive, non-destructive tool for determining the surface area of porous materials.