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Updated: Jun 12, 2026

Cryo-electron Microscopy Specimen Preparation By Means Of a Focused Ion Beam
Published on: July 26, 2014
Fabrication of a TEM sample of ion-irradiated material using focused ion beam microprocessing and low-energy Ar ion
Hyung-Ha Jin1, Chansun Shin, Junhyun Kwon
1Nuclear Materials Research Division, Korea Atomic Energy Research Institute, 1045 Daedeok-daero, Yuseong-Gu, Daejeon, 305-353, Republic of Korea. hhajin2@kaeri.re.kr
Abstract:
Cross-section-view TEM samples of ion-irradiated material are successfully fabricated using a focused ion beam (FIB) system and low-energy Ar ion milling. Ga ion-induced damages in FIB processing are reduced remarkably by the means of low-energy Ar ion milling. There are optimized ion milling conditions for the reduction and removal of the secondary artifacts such as defects and ripples. Incident angles and accelerated voltages are especially more important factors on the preservation of a clean surface far from secondary defects and surface roughing due to Ga and Ar ion bombardment.
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