Related Experiment Video
Updated: Jun 12, 2026

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Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
Published on: September 28, 2019
Low-refractive-index indium-tin-oxyfluoride thin films made by high-rate reactive dc magnetron sputtering
Applied Optics
|June 10, 2010
Abstract:
Indium-tin-oxyfluoride (ITOF) films were prepared by dc magnetron sputtering of indium-tin in Ar + O(2) + CF(4). Spectrophotometric measurements in the 0.2-2.5-microm wavelength range were used to evaluate the dielectric function. Wide band gap ITOF, with a refractive index of ~1.5 in the visible and good durability, was produced at a rate of ~1.2 nms(-1). indium-tin-oxide coatings.

