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Related Concept Videos

Atomic Force Microscopy01:08

Atomic Force Microscopy

Atomic force microscopy (AFM) is a type of scanning probe microscopy that can analyze topographic details of various specimens like ceramics, glass, polymers, and biological samples. AFM offers over 1000 times more resolution than the optical imaging system. Images generated from AFM are three-dimensional surface profiles, offering an advantage over the flat, two-dimensional images from other imaging techniques.
The AFM Probe
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The early pioneers of microscopy opened a window into the invisible world of microorganisms. In 1830, Joseph Jackson Lister created an essentially modern light microscope. The 20th century saw the development of microscopes that leveraged nonvisible light, such as fluorescence microscopy that uses an ultraviolet light source and electron microscopy that uses short-wavelength electron beams. These advances significantly improved magnification, image resolution, and contrast. By comparison, the...
Imperfections in Crystal Structure: Point, Line and Plane Defects01:25

Imperfections in Crystal Structure: Point, Line and Plane Defects

A perfect crystal, in theory, has a uniform structure with the same unit cell and lattice points throughout. However, any deviation from this periodic arrangement is known as an imperfection or defect. These defects can be categorized into three types: point, line, and plane defects.Point defects occur when there is a deviation from the ideal due to missing atoms, displaced atoms, or additional atoms. These imperfections might occur due to imperfect packing during crystallization or because of...

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Updated: Jun 12, 2026

Scanning Electron Microscopic Evaluation of Surface Defects of Remover Retreatment File After Single and Multiple Uses
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Published on: October 11, 2024

Inspection of surface flaws by comparator microscopy.

L R Baker

    Applied Optics
    |June 12, 2010
    PubMed
    Summary
    This summary is machine-generated.

    Objective standards for optical component flaws like digs and scratches are lacking. Comparator microscopy offers a user-friendly solution by measuring flaw size based on light obstruction, potentially forming a new ISO standard.

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    Published on: May 28, 2016

    Area of Science:

    • Optical Engineering
    • Materials Science
    • Metrology

    Background:

    • Growing demand for precise surface quality control in optical components.
    • Existing standards for flaws (digs, scratches) lack objectivity.
    • Need for improved, quantifiable standards for both customers and suppliers.

    Purpose of the Study:

    • To address the lack of objective standards for optical surface flaws.
    • To review current customer and supplier requirements for improved standards.
    • To introduce and evaluate comparator microscopy as a new metrology technique.

    Main Methods:

    • Discussion of customer and supplier requirements for optical component standards.
    • Review of recent attempts to establish more objective flaw assessment.
    • Description of comparator microscopy: identifying line width that obstructs light equivalent to the flaw.

    Main Results:

    • Comparator microscopy demonstrates significant user-centric advantages.
    • The line-equivalent width concept allows comparison of different national standard flaws.
    • The technique is under consideration for an International Organization for Standardization (ISO) standard.

    Conclusions:

    • Comparator microscopy provides an objective and user-friendly method for assessing optical flaws.
    • The line-equivalent width offers a quantifiable metric for flaw comparison.
    • Future applications may include on-machine measurement of flaws and surface polish.