Optimizing deposition parameters of electron beam evaporated TiO(2) films

A study of the major deposition parameters including source material, oxygen partial pressure, substrate temperature, and deposition rate affecting the optical quality of electron beam evaporated TiO(2) films is presented. After careful optimization of these parameters it is possible to reproducibly deposit TiO(2) films from TiO(2) source material mixed with 5% CeO(2) at an oxygen partial pressure of 5 x 10(-5) Torr, a substrate temperature of 320 degrees C, and a deposition rate of 2 A/s.