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Developing an undispersed VUV beamline for large area surface processing
Applied Optics
|June 18, 2010
Summary
A new windowless beamline delivers undispersed vacuum ultraviolet (VUV) radiation for materials processing. This system achieves high optical transmission for synchrotron photon enhanced etching and deposition on semiconductors.
Area of Science:
- Physics
- Materials Science
- Engineering
Background:
- Synchrotron radiation is a powerful tool for materials science.
- Existing beamlines often have limitations in energy range or application scope.
- Windowless designs are crucial for efficient VUV transmission.
Purpose of the Study:
- To present a versatile windowless beamline for undispersed VUV radiation.
- To enable synchrotron photon enhanced etching and deposition processes.
- To achieve high optical transmission of VUV synchrotron light.
Main Methods:
- Construction of an adjustable light guiding assembly with glass capillary arrays.
- Implementation of three differential pumping stages for pressure reduction.
- Characterization of optical transmission for VUV radiation (10 eV–100 eV).
Main Results:
- A windowless beamline for undispersed VUV radiation (10–100 eV) was successfully developed.
- High optical transmission (~30%) of white synchrotron light was achieved.
- Pressure was reduced from 1 mbar to 5 x 10(-9) mbar using differential pumping.
Conclusions:
- The developed beamline is suitable for irradiating large semiconductor areas.
- It facilitates advanced processes like synchrotron photon enhanced etching and deposition.
- The system offers a versatile solution for VUV-based materials modification.
