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A Sample Preparation Pipeline for Microcrystals at the VMXm Beamline
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Developing an undispersed VUV beamline for large area surface processing.

J Janes, N Lutz

    Applied Optics
    |June 18, 2010
    PubMed
    Summary

    A new windowless beamline delivers undispersed vacuum ultraviolet (VUV) radiation for materials processing. This system achieves high optical transmission for synchrotron photon enhanced etching and deposition on semiconductors.

    Area of Science:

    • Physics
    • Materials Science
    • Engineering

    Background:

    • Synchrotron radiation is a powerful tool for materials science.
    • Existing beamlines often have limitations in energy range or application scope.
    • Windowless designs are crucial for efficient VUV transmission.

    Purpose of the Study:

    • To present a versatile windowless beamline for undispersed VUV radiation.
    • To enable synchrotron photon enhanced etching and deposition processes.
    • To achieve high optical transmission of VUV synchrotron light.

    Main Methods:

    • Construction of an adjustable light guiding assembly with glass capillary arrays.
    • Implementation of three differential pumping stages for pressure reduction.
    • Characterization of optical transmission for VUV radiation (10 eV–100 eV).

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    Measurement of X-ray Beam Coherence along Multiple Directions Using 2-D Checkerboard Phase Grating
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    Published on: October 11, 2016

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    Last Updated: Jun 12, 2026

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    Published on: June 17, 2021

    Sample Preparation and Transfer Protocol for In-Vacuum Long-Wavelength Crystallography on Beamline I23 at Diamond Light Source
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    10:39

    Measurement of X-ray Beam Coherence along Multiple Directions Using 2-D Checkerboard Phase Grating

    Published on: October 11, 2016

    Main Results:

    • A windowless beamline for undispersed VUV radiation (10–100 eV) was successfully developed.
    • High optical transmission (~30%) of white synchrotron light was achieved.
    • Pressure was reduced from 1 mbar to 5 x 10(-9) mbar using differential pumping.

    Conclusions:

    • The developed beamline is suitable for irradiating large semiconductor areas.
    • It facilitates advanced processes like synchrotron photon enhanced etching and deposition.
    • The system offers a versatile solution for VUV-based materials modification.