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Related Concept Videos

UV–Vis Spectrometers01:14

UV–Vis Spectrometers

The absorbance of UV and visible (UV–visible) radiations is measured using a UV–visible spectrophotometer. Deuterium lamps, which emit UV radiation, and tungsten lamps, which produce radiation in the visible region, are used as light sources in UV–visible spectrophotometers. A monochromator or prism is used for diffraction grating, i.e., to split the incoming radiation into different wavelengths. A system of slits is used to focus the desired wavelength on the sample cell. Samples for...
Overview of Electron Microscopy01:25

Overview of Electron Microscopy

The wavelengths of visible light ultimately limit the maximum theoretical resolution of images created by light microscopes. Most light microscopes can only magnify 1000X, and a few can magnify up to 1500X. Electrons, like electromagnetic radiation, can behave like waves, but with wavelengths of 0.005 nm, they produce significantly greater resolution up to 0.05 nm as compared to 500 nm for visible light. An electron microscope (EM) can create a sharp image that is magnified up to 2,000,000X.
Super-resolution Fluorescence Microscopy01:37

Super-resolution Fluorescence Microscopy

Super-resolution fluorescence microscopy (SRFM) provides a better resolution than conventional fluorescence microscopy by reducing the point spread function (PSF). PSF is the light intensity distribution from a point that causes it to appear blurred. Due to PSF, each fluorescing point appears bigger than its actual size, and it is the PSF interference of nearby fluorophores that causes the blurred image. Various approaches to achieving higher resolution through SRFM have recently been developed.
Ultraviolet and Visible (UV–Vis) Spectroscopy: Overview01:02

Ultraviolet and Visible (UV–Vis) Spectroscopy: Overview

Ultraviolet–visible (UV–visible or UV–Vis) spectroscopy is an analytical technique that investigates the interaction between matter and UV–Vis light within the electromagnetic spectrum. This method is widely used for its versatility, simplicity, and relatively quick data acquisition, making it valuable for both qualitative and quantitative analysis. When UV–Vis radiation passes through a material,  molecules absorb light depending on the energy required for electronic transitions. As a result...
Overview of Microscopy Techniques01:22

Overview of Microscopy Techniques

The early pioneers of microscopy opened a window into the invisible world of microorganisms. In 1830, Joseph Jackson Lister created an essentially modern light microscope. The 20th century saw the development of microscopes that leveraged nonvisible light, such as fluorescence microscopy that uses an ultraviolet light source and electron microscopy that uses short-wavelength electron beams. These advances significantly improved magnification, image resolution, and contrast. By comparison, the...
Transmission Electron Microscopy01:15

Transmission Electron Microscopy

In 1931, physicist Ernst Ruska—building on the idea that magnetic fields can direct an electron beam just as lenses can direct a beam of light in an optical microscope—developed the first prototype of the electron microscope. This development led to the development of the field of electron microscopy. In the transmission electron microscope (TEM), electrons are produced by a hot tungsten element and accelerated by a potential difference in an electron gun, which gives them up to 400 keV in...

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Related Experiment Video

Updated: Jun 12, 2026

Super-Resolution Microscopy of the Synaptonemal Complex Within the Caenorhabditis elegans Germline
09:14

Super-Resolution Microscopy of the Synaptonemal Complex Within the Caenorhabditis elegans Germline

Published on: September 13, 2022

Deep ultraviolet microscope.

P A Heimann, R Urstadt

    Applied Optics
    |June 18, 2010
    PubMed
    Summary
    This summary is machine-generated.

    A modified visible-light microscope now captures deep ultraviolet (UV) images, offering enhanced resolution and contrast for materials science and semiconductor inspection. This deep UV microscopy technique improves imaging of opaque organic and semiconducting materials.

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    Imaging Replicative Domains in Ultrastructurally Preserved Chromatin by Electron Tomography
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    Imaging Replicative Domains in Ultrastructurally Preserved Chromatin by Electron Tomography

    Published on: May 20, 2022

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    Last Updated: Jun 12, 2026

    Super-Resolution Microscopy of the Synaptonemal Complex Within the Caenorhabditis elegans Germline
    09:14

    Super-Resolution Microscopy of the Synaptonemal Complex Within the Caenorhabditis elegans Germline

    Published on: September 13, 2022

    Imaging Replicative Domains in Ultrastructurally Preserved Chromatin by Electron Tomography
    14:56

    Imaging Replicative Domains in Ultrastructurally Preserved Chromatin by Electron Tomography

    Published on: May 20, 2022

    Area of Science:

    • Optics and Photonics
    • Materials Science
    • Microscopy

    Background:

    • Traditional visible-light microscopy has limitations in resolution and contrast for certain advanced materials.
    • Organic and semiconducting materials often exhibit transparency or color under visible light, hindering detailed analysis.
    • Multilayered structures can present imaging artifacts with conventional microscopy techniques.

    Purpose of the Study:

    • To adapt a visible-light microscope for deep ultraviolet (UV) imaging (190-350 nm) using reflected illumination.
    • To explore the advantages of deep UV microscopy for material characterization.
    • To propose applications for this enhanced microscopy in integrated circuit (IC) manufacturing.

    Main Methods:

    • Modification of a standard visible-light microscope to incorporate deep UV illumination (190-350 nm).
    • Utilizing reflected illumination within the deep UV spectrum.
    • Characterization of imaging performance, including resolution, depth of focus, and contrast.

    Main Results:

    • Achieved deep UV imaging capabilities with potential for improved resolution, depth of focus, and contrast.
    • Demonstrated enhanced imaging of materials that are transparent or colored under visible light, becoming opaque in deep UV.
    • Observed fewer artifacts when imaging multilayered structures compared to visible-light microscopy.

    Conclusions:

    • Deep UV microscopy offers significant advantages over visible-light microscopy for specific material types and structures.
    • The modified microscope provides a valuable tool for inspecting organic and semiconducting materials.
    • Potential applications are identified for quality control and failure analysis in integrated circuit fabrication.