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Updated: Jun 10, 2026

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
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Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures

Published on: December 5, 2015

Quantification of sample thickness and in-concentration of InGaAs quantum wells by transmission measurements in a

T Volkenandt1, E Müller, D Z Hu

  • 1Laboratorium für Elektronenmikroskopie, Karlsruher Institut für Technologie, 76128 Karlsruhe, Germany. tobias.volkenandt@kit.edu

Microscopy and Microanalysis : the Official Journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada
|July 17, 2010
PubMed

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