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Updated: Jun 10, 2026

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Fabrication of Micro-Patterned Chip with Controlled Thickness for High-Throughput Cryogenic Electron Microscopy
Published on: April 21, 2022
Nanofabrication at high throughput and low cost
Benjamin J Wiley1, Dong Qin, Younan Xia
1Department of Chemistry, Duke University, Durham, North Carolina 27708, USA. bjw@duke.edu
ACS Nano
|August 11, 2010
Summary
Nanoskiving offers a dual approach to nanofabrication, enabling both the initial generation and rapid replication of nanostructures. This unique method facilitates high-throughput, low-cost production of patterned nanomaterials.
Area of Science:
- Materials Science
- Nanotechnology
- Manufacturing Engineering
Background:
- Nanofabrication involves pattern generation and replication.
- Current generation techniques are typically slow and serial, limiting scalability.
- High-throughput, low-cost fabrication requires efficient duplication methods.
