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Updated: Jun 10, 2026
Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
Published on: January 19, 2020
E-beam lithography for micro-nanofabrication
1Melbourne Centre for Nanofabrication, 151 Wellington Rd., Clayton, Victoria 3168, Australia.
Abstract:
Electron beam lithography (EBL) is one of the tools of choice for writing micro- and nanostructures on a wide variety of materials. This is largely due to the fact that modern EBL machines are capable of writing nanometer-sized structures on areas up to mm(2). The aim of this contribution is to give technical and practical backgrounds in this extremely flexible nanofabrication technique.
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