TiO(2)-SiO(2) mixed films prepared by the fast alternating sputter method

We introduced the fast alternating sputter method and its application on deposition of TiO(2)-SiO(2) mixed films. By using fast alternating sputter, the TiO(2) and SiO(2) were completely mixed in the film, and no thinpair structure could be found by x-ray diffraction. The structure of the mixed films was amorphous in a wide composition range. The optical properties of the mixed films in the visible and near infrared changed from SiO(2)-dominant to TiO(2)-dominant as TiO(2) content in the film increased.