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Measurement of Quantum Interference in a Silicon Ring Resonator Photon Source

Measurement of Quantum Interference in a Silicon Ring Resonator Photon Source

Published on: April 4, 2017

Ultra-large multi-region photon sieves.

Zhifeng Chen¹, Chinhua Wang, Donglin Pu

¹Key Lab of Modern Optical Technologies of Jiangsu Province, Institute of Modern Optical Technologies, Soochow University, Suzhou, 215006, China.

|August 20, 2010

Summary

A new multi-region design for ultra-large photon sieves improves focusing by matching phase and pinhole area. This method enhances energy efficiency and suppresses sidelobes, enabling larger, high-numerical-aperture devices via UV lithography.

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Measurement of Quantum Interference in a Silicon Ring Resonator Photon Source

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Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station

Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station

Published on: April 1, 2020

Area of Science:

Optics and Photonics
Nanofabrication

Background:

Photon sieves offer unique focusing properties but are limited in size and numerical aperture.
Conventional designs struggle with sidelobe suppression and energy efficiency for large-scale applications.

Purpose of the Study:

To propose and demonstrate a novel multi-region design for ultra-large photon sieves in the visible spectrum.
To introduce a design principle based on phase matching and total pinhole area matching.
To compare the focusing performance of multi-region versus monolithic photon sieves.

Main Methods:

Developed a design principle incorporating phase and total pinhole area matching across multiple regions.
Fabricated two photon sieves (50mm and 125mm diameter) with 3 and 4 regions using UV lithography.
Evaluated performance through imaging tests, comparing energy efficiency and sidelobe suppression.

Main Results:

Demonstrated superior sidelobe suppression and energy efficiency in multi-region photon sieves compared to monolithic designs.
Successfully fabricated ultra-large photon sieves with high numerical aperture using UV lithography.
Validated the effectiveness of the phase and area matching design principle.

Conclusions:

The multi-region design approach is effective for creating ultra-large photon sieves with enhanced performance.
The proposed method enables high-numerical-aperture photon sieves beyond the capabilities of e-beam lithography.
This work introduces a new ring-to-ring design concept for advanced photon sieve fabrication.