Aligning lithography on opposite surfaces of a substrate
Applied Optics
|August 31, 2010
Summary
New equipment precisely aligns lithographic features on opposite substrate surfaces within 1 micrometer. This technology enables registration with existing patterns on opaque materials.
Area of Science:
- Microfabrication
- Nanotechnology
- Metrology
Background:
- Accurate alignment of features on opposing substrate surfaces is critical for advanced microelectronic and photonic devices.
- Existing alignment techniques face limitations with opaque substrates and achieving sub-micrometer precision.
Purpose of the Study:
- To develop and present novel equipment for high-precision lithographic feature alignment between opposite substrate surfaces.
- To demonstrate the capability of this equipment for opaque substrates and registration to pre-existing features.
Main Methods:
- Development of specialized equipment integrating advanced optical and mechanical alignment systems.
- Utilizing a novel registration method for aligning features across substrate surfaces.
Main Results:
- Achieved alignment accuracy of lithographic features to within 1 micrometer between opposite substrate surfaces.
- Demonstrated successful operation with opaque substrates, enabling registration to existing features.
Conclusions:
- The developed equipment offers a significant advancement in high-precision alignment for microfabrication.
- This technology facilitates the fabrication of complex devices requiring precise feature placement on both sides of substrates, including opaque materials.
