Recording complex holograms on photoresist by using an ion-implantation method

Photoresists have traditionally been used as a holographic recording medium for phase holograms. We demonstrate the recording of a binary amplitude hologram on photoresist by using an ion-implantation method. This amplitude recording property is based on the fact that the optical transmittance of photoresist can be changed by a high-dose ion implantation. A novel complex-hologram recording method is proposed in which the phase is represented by photoresist thickness and the amplitude is encoded on its optical transmittance.