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Related Concept Videos

Confocal Fluorescence Microscopy01:16

Confocal Fluorescence Microscopy

Confocal microscopy is an advanced microscopic technique. The prime advantage of the confocal microscope over other microscopy techniques is its ability to block the out-of-focus light from the illuminated samples using pinholes. It is widely used with fluorescence optics to obtain high-resolution, sharp contrast images. Unlike optical microscopes, confocal microscopes use a focused beam of light laser to scan the entire sample surface at different z-planes. These microscopes are, therefore,...

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Updated: Jun 8, 2026

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices
10:18

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

Published on: January 27, 2017

Multilayer mirror technology for soft-x-ray projection lithography.

D G Stearns, R S Rosen, S P Vernon

    Applied Optics
    |September 22, 2010
    PubMed
    Summary
    This summary is machine-generated.

    Recent advances in multilayer mirror technology enable soft-x-ray projection lithography (SXPL). High reflectivity Mo/Si multilayers achieve 66% normal-incidence reflectivity, meeting SXPL throughput needs.

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    Published on: January 25, 2021

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    Last Updated: Jun 8, 2026

    Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices
    10:18

    Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

    Published on: January 27, 2017

    Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices
    06:21

    Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

    Published on: January 25, 2021

    Area of Science:

    • Optics and Photonics
    • Materials Science
    • Nanotechnology

    Background:

    • Soft-X-ray projection lithography (SXPL) requires advanced multilayer mirror technology.
    • Current multilayer mirrors face stringent demands for reflectivity and uniformity.

    Purpose of the Study:

    • To assess the suitability of recent multilayer mirror advancements for SXPL.
    • To explore the application of graded multilayer coatings for optical figure modification.

    Main Methods:

    • Characterization of Mo/Si multilayers for normal-incidence reflectivity at 13.4 nm.
    • Analysis of layer thickness control during deposition (approx. 0.5%).
    • Investigation of graded multilayer coatings for varying angles of incidence.

    Main Results:

    • Maximum normal-incidence reflectivity of 66% achieved for Mo/Si multilayers.
    • Reflectivity is sufficient for SXPL x-ray throughput requirements.
    • Uniform coatings maintain surface figure critical for diffraction-limited performance.

    Conclusions:

    • Mo/Si multilayer technology meets key SXPL requirements.
    • Graded multilayer coatings offer a method for precise aspheric optic fabrication without increased roughness.