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Related Concept Videos

Masking and Demasking Agents01:19

Masking and Demasking Agents

EDTA titrations may necessitate masking and demasking agents to temporarily protect a particular metal ion in a mixture from the EDTA reaction. These agents facilitate the sequential analysis of the metal ions by forming stable complexes with some—but not all—metal ions during certain steps.
There are many masking agents, such as cyanide, fluoride, triethanolamine, thiourea, and 2,3-bis(sulfanyl)propan-1-ol (formerly 2,3-dimercapto-1-propanol), with the masking agent chosen based on the metal...

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Related Experiment Video

Updated: Jun 8, 2026

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices
06:21

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

Published on: January 25, 2021

Reflection mask defect repair.

A M Hawryluk, D Stewart

    Applied Optics
    |September 22, 2010
    PubMed
    Summary
    This summary is machine-generated.

    A new method repairs opaque defects on soft-x-ray projection lithography masks using ion-beam etching and a silicon overcoat. This technique effectively clears defects without damaging the multilayer mirror.

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    Last Updated: Jun 8, 2026

    Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices
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    Published on: January 25, 2021

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    Area of Science:

    • Materials Science
    • Nanotechnology
    • Semiconductor Manufacturing

    Background:

    • Soft-x-ray projection lithography is crucial for semiconductor fabrication.
    • Opaque defects on reflection masks can hinder lithography precision.
    • Existing repair methods may damage delicate multilayer mirrors.

    Purpose of the Study:

    • To develop a novel technique for repairing opaque defects on soft-x-ray projection lithography reflection masks.
    • To ensure defect repair without compromising the integrity of the multilayer mirror.
    • To avoid introducing additional absorptive elements into the mask structure.

    Main Methods:

    • Utilized ion-beam etching for defect removal.
    • Employed a thin silicon (Si) overcoat to protect the multilayer mirror during etching.
    • Used low atomic number ions (Silicon or Argon) at reduced beam energy.

    Main Results:

    • Successfully cleared opaque defects from the reflection masks.
    • Demonstrated that the technique does not damage the underlying multilayer mirror.
    • Confirmed no introduction of absorptive elements post-repair.

    Conclusions:

    • The developed ion-beam etching technique with a Si overcoat is an effective method for repairing opaque defects on soft-x-ray lithography masks.
    • This approach preserves the functionality of the multilayer mirror.
    • It offers a non-damaging and non-contaminating solution for mask repair.