Jove
Visualize
Contact Us

Related Concept Videos

Masking and Demasking Agents01:19

Masking and Demasking Agents

EDTA titrations may necessitate masking and demasking agents to temporarily protect a particular metal ion in a mixture from the EDTA reaction. These agents facilitate the sequential analysis of the metal ions by forming stable complexes with some—but not all—metal ions during certain steps.
There are many masking agents, such as cyanide, fluoride, triethanolamine, thiourea, and 2,3-bis(sulfanyl)propan-1-ol (formerly 2,3-dimercapto-1-propanol), with the masking agent chosen based on the metal...

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Integrated Cancer System: a perspective on developing an integrated system for cancer services in London.

London journal of primary care·2015
Same author

Management of egfr tki-induced dermatologic adverse events.

Current oncology (Toronto, Ont.)·2015
Same author

Perioperative management of severe anorexia nervosa.

British journal of anaesthesia·2015
Same author

Access to medicines in remote and rural areas: a survey of residents in the Scottish Highlands & Western Isles.

Public health·2015
Same author

Towards Canine Rabies Elimination in KwaZulu-Natal, South Africa: Assessment of Health Economic Data.

Transboundary and emerging diseases·2014
Same author

Development and evaluation of The KIT: Keeping It Together™ for Youth (the 'Youth KIT') to assist youth with disabilities in managing information.

Child: care, health and development·2014
Same journal

Multifunctional reconfigurable terahertz metasurface based on vanadium dioxide phase transition: achieving broadband absorption and efficient polarization conversion.

Applied optics·2026
Same journal

High-Q-factor electromagnetically induced transparency utilizing quasi-bound states in the continuum in an all-dielectric terahertz metasurface.

Applied optics·2026
Same journal

Automated stitching interferometry for high-precision metrology of X-ray mirrors.

Applied optics·2026
Same journal

Experimental demonstration of an approach to designing a metal-dielectric DBR resonant cavity structure.

Applied optics·2026
Same journal

High-precision wavefront reconstruction from a single-shot interferogram using a physics-driven hybrid feature calibration network.

Applied optics·2026
Same journal

Ultra-high-Q Fano resonance based on coupled topological corner states in Kagome photonic crystals.

Applied optics·2026
See all related articles
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Experiment Video

Updated: Jun 8, 2026

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices
06:21

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

Published on: January 25, 2021

Reflection mask defect repair.

A M Hawryluk, D Stewart

    Applied Optics
    |September 22, 2010
    PubMed
    Summary
    This summary is machine-generated.

    A new method repairs opaque defects on soft-x-ray projection lithography masks using ion-beam etching and a silicon overcoat. This technique effectively clears defects without damaging the multilayer mirror.

    More Related Videos

    Fabrication of Flexible Image Sensor Based on Lateral NIPIN Phototransistors
    09:59

    Fabrication of Flexible Image Sensor Based on Lateral NIPIN Phototransistors

    Published on: June 23, 2018

    Subsurface Defect Localization by Structured Heating Using Laser Projected Photothermal Thermography
    11:34

    Subsurface Defect Localization by Structured Heating Using Laser Projected Photothermal Thermography

    Published on: May 15, 2017

    Related Experiment Videos

    Last Updated: Jun 8, 2026

    Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices
    06:21

    Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

    Published on: January 25, 2021

    Fabrication of Flexible Image Sensor Based on Lateral NIPIN Phototransistors
    09:59

    Fabrication of Flexible Image Sensor Based on Lateral NIPIN Phototransistors

    Published on: June 23, 2018

    Subsurface Defect Localization by Structured Heating Using Laser Projected Photothermal Thermography
    11:34

    Subsurface Defect Localization by Structured Heating Using Laser Projected Photothermal Thermography

    Published on: May 15, 2017

    Area of Science:

    • Materials Science
    • Nanotechnology
    • Semiconductor Manufacturing

    Background:

    • Soft-x-ray projection lithography is crucial for semiconductor fabrication.
    • Opaque defects on reflection masks can hinder lithography precision.
    • Existing repair methods may damage delicate multilayer mirrors.

    Purpose of the Study:

    • To develop a novel technique for repairing opaque defects on soft-x-ray projection lithography reflection masks.
    • To ensure defect repair without compromising the integrity of the multilayer mirror.
    • To avoid introducing additional absorptive elements into the mask structure.

    Main Methods:

    • Utilized ion-beam etching for defect removal.
    • Employed a thin silicon (Si) overcoat to protect the multilayer mirror during etching.
    • Used low atomic number ions (Silicon or Argon) at reduced beam energy.

    Main Results:

    • Successfully cleared opaque defects from the reflection masks.
    • Demonstrated that the technique does not damage the underlying multilayer mirror.
    • Confirmed no introduction of absorptive elements post-repair.

    Conclusions:

    • The developed ion-beam etching technique with a Si overcoat is an effective method for repairing opaque defects on soft-x-ray lithography masks.
    • This approach preserves the functionality of the multilayer mirror.
    • It offers a non-damaging and non-contaminating solution for mask repair.